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Numerical Heat Transfer, Part A: Applications
An International Journal of Computation and Methodology
Volume 44, 2003 - Issue 2
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Original Articles

EFFECTS OF THERMAL DIFFUSION AND SUBSTRATE TEMPERATURE ON SILICON DEPOSITION IN AN IMPINGING-JET CVD REACTOR

C. L. Leakeas Department of Aerospace Engineering and Mechanics, The University of Alabama, Tuscaloosa, Alabama, USA
&
M. A. R. Sharif Department of Aerospace Engineering and Mechanics, The University of Alabama, Tuscaloosa, Alabama, USA
Pages 127-147 | Published online: 02 Feb 2011

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