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Papers
High-rate and wide-area deposition of epitaxial Si films by mesoplasma chemical vapor deposition
Sudong Wu Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, JapanCorrespondence[email protected]
, Kento Sawada Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
, Tomonori Ichimaru Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
, Takanori Yamamoto Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
, Makoto Kambara Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
& Toyonobu Yoshida Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
Article: 035001
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Received 03 Mar 2014, Accepted 16 Apr 2014, Published online: 14 May 2014
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