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Ferroelectrics Volume 380, 2009 - Issue 1
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Original Articles

Chemical Reactions During Wet-Etching Process of LSMO/PZT/LSMO-Structured Device Fabrication

Tsung-Her Yeh Department of Mechanical Engineering, National Taiwan University of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei, 106, Taiwan, R.O.C
,
M. B. Suresh Department of Mechanical Engineering, National Taiwan University of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei, 106, Taiwan, R.O.C
,
Jun-Nan Shen Department of Mechanical Engineering, National Taiwan University of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei, 106, Taiwan, R.O.C
,
Jyh-Cheng Yu Department of Mechanical and Automation Engineering, National Kaohsiung First University of Science and Technology, 2, Juoyue Rd., Nantz District, Kaohsiung, 811, Taiwan, R.O.C
&
Chen-Chia Chou Department of Mechanical Engineering, National Taiwan University of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei, 106, Taiwan, R.O.C
Pages 97-101 | Received 03 Aug 2008, Accepted 31 Dec 2008, Published online: 20 Sep 2010

References

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  • Zheng , K. , Lu , J. and Chu , J. 2004 . A novel wet etching process of Pb(Zr,Ti)O3 thin films for applications in microelectromechanical system . Jap. J. Appl. Phys. , 43 : 3934 – 3937 .
  • Mace , H. , Archard , H. and Peccoud , L. 1995 . Reactive ion etching of Pt/PZT/Pt ferroelectric thin film capacitors in high density DECR plasma . Microelectron. Eng. , 29 : 45 – 48 .

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