References
- Pratt , I. H. and Firestone , S. 1971 . Fabrication of rf-Sputtered Barium Titanate Thin Films . J. Vac. Sci. Technol , 8 : 256 – 260 .
- Li , P. and Liu , T. M. 1990 . Reactive Partially Ionized Beam Deposition of BaTiO3 Thin Films . Appl. Phys. Lett. , 57 : 2336 – 2338 .
- Kwak , B. S. , Zhang , K. , Boyd , E. P. , Erbil , A. and Wilkens , B. J. 1991 . Metalorganic Chemical Vapor Deposition of BaTiO3 Thin Films . J Appl. Phys. , 69 : 767 – 772 .
- Kamalasanan , M. N. , Chandra , S. , Joshi , P. C. and Mansingh , A. 1991 . Structural and Optical Properties of Sol-Gel-Processed BaTiO3 Ferroelectric Thin Films . Appl. Phys. Lett. , 59 : 3547 – 3549 .
- Roy , D. and Krupanidhi , S. B. 1992 . Pulsed Excimer Laser Ablated Barium Titante Thin Films . Appl. Phys. Lett. , 61 : 2057 – 2059 .
- Kolawa , E. , So , F. C. T. , Pan , E. T. S. and Nicolet , M. A. 1987 . Reactively Sputtered RuO2 Diffusion Barriers . Appl. Phys. Lett. , 50 : 854 – 855 .
- Krusin-Elbaum , L. , Wittmer , M. and Yee , D. S. 1987 . Characterization of Reactively Sputtered Ruthenium Dioxide for Very Large Scale Integrated Metallization . Appl. Phys. Lett. , 50 : 1879 – 1881 .
- Jia , Q. X. , Shi , Z. Q. and Anderson , W. A. 1992 . BaTiO3 Thin Film Capacitors Using Metallic Oxide as an Electrode . presented at the 34th Electronic Materials Conf. (EMC) . Jun. 24–26 1992 , Cambridge, MA.
- Jia , Q. X. , Jiao , K. L. , Anderson , W. A. and Collins , F. M. 1993 . Development and Fabrication of Stable RuO2 Thin Film Resistors . Mater. Sci. Eng. B , 18 : 220 – 225 .
- Li , P. and Lu , T. M. 1991 . Direct Observation of BaTiO3 Microcrystallites in Thin Amorphous BaTiO3 Films . Appl. Phys. Lett. , 59 : 1064 – 1605 .
- Harrop , P. J. and Campbell , D. S. 1968 . Selection of Thin Film Capactior Dielectrics . Thin Solid Films , 2 : 273 – 292 .
- Jia , Q. X. , Shi , Z. Q. and Anderson , W. A. 1992 . BaTiO3 Thin Films Capacitors Deposited by RF Magnetron Sputtering . Thin Solid Films , 209 : 230 – 239 .