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Ferroelectrics Volume 219, 1998 - Issue 1
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Section V: Ferroelasticity, thin films and applications

Preparation of LiNbO3 thin films by bias sputtering

Takashi Nishida Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Sakyo-ku, Kyoto, 606-01, Japan
,
Tadashi Shiosaki Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Sakyo-ku, Kyoto, 606-01, Japan
,
Toshihisa Horiuchi Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Sakyo-ku, Kyoto, 606-01, Japan
&
Kazumi Matsusige Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Sakyo-ku, Kyoto, 606-01, Japan
Pages 9-13 | Received 24 Mar 1998, Published online: 09 Mar 2011

References

  • Nishida , T. , Shimizu , M. , Horiuchi , T. , Shiosaki , T. and Matsushige , K. 1995 . Jpn. J. Appl. Phys. , 34 : 5113
  • Hu , W. , Liu , Z. and Feng , D. 1996 . J. Appl. Phys. , 86 : 7089
  • Liu , Z. , Hu , W. , Guo , X. , Liu , J. and Feng , D. 1997 . Appl. Surf. Sci. , 110 : 520

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