References
- S. M. Huang, C. W. Liu and W. P. Dow: J. Electrochem. Soc., 2012, 159, D135–D141. doi: 10.1149/2.010203jes
- Q. S. Zhu, X. Zhang, C. Z. Liu and H. Y. Liu: J Electrochem Soc, 2018, 166, D3006–D3012. doi: 10.1149/2.0021901jes
- L. X. Ji, C. Wang, S. X. Wang, W. He and D. J. Xiao: Trans. IMF, 2016, 94, 49–56. doi: 10.1080/00202967.2015.1124638
- S. Ren, Z. Lei and Z. Wang: Trans. IMF, 2015, 93, 190–195. doi: 10.1179/0020296715Z.000000000251
- L. T. Yin, J. S. Pan, C. Leygraf and Y. Jin: J. Electrochem. Soc., 2018, 165, D604–D611. doi: 10.1149/2.0291813jes
- L. X. Ji, H. X. Nie, S. D. Su, Y. M. Chen, W. He and K. H. Ai: Trans. IMF, 2018, 96, 86–94. doi: 10.1080/00202967.2018.1426174
- M. Tan, C. Guymon, D. R. Wheeler and J. N. Harb: J. Electrochem. Soc., 2007, 154, D78–D81. doi: 10.1149/1.2401057
- N. Xiao, N. Li, G. F. Cui, D. Tian, S. Y. Yu, Q. Li and G. Wu: J. Electrochem. Soc., 2013, 160, D188–D195. doi: 10.1149/2.015306jes
- Z. W. Lei, L. Chen, W. L. Wang, Z. L. Wang and C. Zhao: Electrochim Acta, 2015, 178, 546–554. doi: 10.1016/j.electacta.2015.08.037
- T. P. Moffat, D. Wheeler and D. Josell: J. Electrochem. Soc., 2004, 151, C262–C271. doi: 10.1149/1.1651530
- W. P. Dow, M. Y. Yen, W. B. Lin and S. W. Ho: J Electrochem Soc, 2005, 152, C769–C775. doi: 10.1149/1.2052019
- W. P. Dow, C. C. Li, Y. C. Su, S. P. Shen, C. C. Huang, C. Lee, B. Hsu and S. Hsu: Electrochim Acta, 2009, 54, 5894–5901. doi: 10.1016/j.electacta.2009.05.053
- C. Wang, J. Q. Zhang, P. X. Yang and M. Z. An: Int. J. Electrochem. Sci., 2012, 7, 10644–10651.
- W. P. Dow, M. Y. Yen, S. Z. Liao, Y. D. Chiu and H. C. Huang: Electrochim Acta, 2008, 53, 8228–8237. doi: 10.1016/j.electacta.2008.06.042
- S.-K. Kim, D. Josell and T. P. Moffat: J. Electrochem. Soc., 2006, 153, C826–C833. doi: 10.1149/1.2354456