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Photographic Technology Supplement

Properties of Liquid Photoresists used in the Photoetching of Stainless SteelFootnote

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Pages 250-253 | Received 10 Aug 1977, Published online: 22 Jul 2016

References

  • Gresham, D. C., “The manufacture of metal diaphragms having very accurate perforations”, Process Engravers Monthly, 58, 42 (1951).
  • Harris, W. T., “Chemical milling” (Clarendon Press, Oxford, 1976), Chapter 8.
  • Stevens, G. W. W., “Photofabrication at extreme resolution”, The Production Engineer, 51, 415 (1972).
  • Davis, R. and Pope, C. I., “Techniques for ruling and etching precise scales in glass and their reproduction by photoetching with a new light-sensitive resist”, National Bureau of Standards, Circular 565 (August 1955).
  • Kodak Ltd., “Photofabrication using ‘Kodak’ Photo Resist Type 3 and ancillary chemicals”, p. 2 (July 1976).
  • Allen, D. M., Horne, D. F. and Stevens, G. W. W., “Quantitative examination of photofabricated profiles”. Parts I and 2 submitted for publication in The Production Engineer.
  • DeForest, W. S., “Photoresist Materials and Processes” (McGraw-Hill, New York, 1975), p. 24.

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