Run-to-Run Process Control: Literature Review and Extensions

References

• Astrom, K. J. (1970). Introduction to Stochastic Control. Academic Press, New York, NY.
   Google Scholar
• Astrom, K. J.; Borisson, U.; Ljung, L.; and Wittenmark, B. (1977). “Theory and Applications of Self-Tuning Regular tors”. Automatica 13, pp. 457–476.
   Web of Science ®Google Scholar
• Astrom, K. J. and Wittenmark, B. (1973). “On Self Tuning Regulators”. Automatica 9, pp. 185–199.
   Web of Science ®Google Scholar
• Astrom, K. J. and Wittenmark, B. (1989). Adaptive Control. Addison-Wesley, Reading, MA.
   Google Scholar
• Astrom, K. J. and Wittenmark, B. (1990). Computer Controlled Systems. Theory and Design, 2nd ed., Prentice Hall, Englewood Cliffs, NJ.
   Google Scholar
• Boning, D. S. and Mozumder, P.K. (1994). “DOE/Opt: A System for Design of Experiments, Response Surface Modeling, and Optimization Using Process and Device Simulation”. IEEE Transactions on Semiconductor Manufacturing 7, pp. 233–244.
   Web of Science ®Google Scholar
• Box, G. E. P. and Draper, N. R. (1987). Empirical Model-Building and Response Surfaces. John Wiley & Sons, New York, NY.
   Google Scholar
• Box, G. E. P. and Jenkins, G. M. (1963). “Further Contributions to Adaptive Quality Control: Simultaneous Estimation of Dynamics: Nonzero Costs”. Bulletin of the International Statistical Institute 34, pp. 943–974.
   Google Scholar
• Box, G. E. P. and Jenkins, G. M. (1974). Time Series Analysis, Forecasting, and Control, Revised edition, Holden Day, Oakland, CA.
   Google Scholar
• Box, G. E. P.; Jenkins, G. M. and Reinsel, G. C. (1994). Time Series Analysis, Forecasting, and Control, 3rd ed., Prentice Hall, Englewood Cliffs, NJ.
   Google Scholar
• Box, G. E. P. and Kramer, T. (1992). “Statistical Process Monitoring and Feedback Adjustment-A Discussion”. Technometrics 34, pp. 251–267.
   Web of Science ®Google Scholar
• Box, G. E. P. and MacGregor, J. F. (1976). “Parameter Estimation with Closed-Loop Operating Data”. Technometrics 18, pp. 371–380.
   Web of Science ®Google Scholar
• Box, G. E. P. and Wilson, K. B. (1951). “On the Experimental Attainment of Optimum Conditions”. Journal of the Royal Statistical Society B 13, pp. 1–38.
   Google Scholar
• Butler, S. W. and Stefani, J. A. (1994). “Supervisory Run-to-Run Control of a Polysilicon gate Etch Using In Situ Ellipsometry”. IEEE Transactions on Semiconductor Manufacturing 7, pp. 193–201.
   Web of Science ®Google Scholar
• Clarke, D. W. and Gawthrop, P. J. (1975). “Self Tuning Controller”. IIE Proceedings 132, pp. 929–935.
   Google Scholar
• Gaston, G. J. and Walton, A. J. (1994). “The Integration of Simulation and Response Surface Methodology for the Optimization of IC Processes”. IEEE Transactions on Semiconductor Manufacturing 7, pp. 22–33.
   Web of Science ®Google Scholar
• Gill, P. E.; Murray, W.; Saunders, M.A.; and Wright, M. H. (1986). “User's Guide for NPSOL (Smooth Nonlinear Constrained Optimization), a Fortran Package for Nonlinear Programming”. Technical Report SOL-86, Systems Optimization Laboratory, Stanford University, Stanford, CA.
   Google Scholar
• Guo, R. S. and Sachs, E. (1993). “Modeling, Optimization and Control of Spatial Uniformity in Manufacturing Processes”. IEEE Transactions on Semiconductor Manufacturing 6, pp. 41–57.
   Web of Science ®Google Scholar
• Harris, T. J. (1989). “Assessment of Control Loop Performance”. Canadian Journal of Chemical Engineering 67, pp. 856–861.
   Web of Science ®Google Scholar
• Harris, T. J.; MacGregor, J. F. and Wright, J. D. (1980). “Self-Tuning and Adaptive Controllers: An Application to Catalytic Reactor Control”. Technometrics 22, pp. 153–164.
   Web of Science ®Google Scholar
• Hoerl, A. E. and Kennard, R. W. (1970). “Ridge Regression: Biased Estimation for Non-orthogonal Problems”. Technometrics 12, pp. 55–67.
   Web of Science ®Google Scholar
• Hurwitz, A. (1993). “Sequential Process Optimization With a Commercial Package”. Sixth National Symposium on Statistics & Design in Automated Manufacturing. Arizona State University, Tempe, AZ.
   Google Scholar
• Ingolfsson, A. and Sachs, E. (1993). “Stability and Sensitivity of an EWMA Controller”. Journal of Quality Technology 25, pp. 271–287.
   Web of Science ®Google Scholar
• Ljung, L. (1987). System Identification. Prentice Hall, Englewood Cliffs, NJ.
   Google Scholar
• Ljung, L. and Soderstrom, T. (1987). Theory and Practice of Recursive Identification. MIT Press, Cambridge, MA.
   Google Scholar
• MacGregor, J. F. (1988). “On-Line Statistical Process Control”. Chemical Engineering Progress 84, pp. 21–31.
   Web of Science ®Google Scholar
• MacGregor J. F. and Tidwell, P. W. (1977). “Discrete Stochastic Control with Input Constraints”. IEE Conference Proceedings 124, pp. 732–734.
   Web of Science ®Google Scholar
• Mandel, B. J. (1969). “The Regression Control Chart”. Journal of Quality Technology 1, pp. 1–9.
   Google Scholar
• Montgomery, D. C. (1996). Introduction to Statistical Quality Control, 3rd ed., John Wiley & Sons, New York, NY.
   Google Scholar
• Montgomery, D. C.; Keats, J. B.; Runger, G. C.; and Messina, W. S. (1994). “Integrating Statistical Process Control and Engineering Process Control”. Journal of Quality Technology 26, pp. 79–87.
   Web of Science ®Google Scholar
• Moyne, J. and Etemad, H. (1992). “An Assessment of the Use of ULTRAMAX as the Process Optimizer in a VLSI Manufacturing Run-to-Run System”. DTM Center, Electrical Engineering & Computer Science Department, The University of Michigan, Ann Arbor, MI.
   Google Scholar
• Mozumder, P. K. and Barna, G. G. (1994). “Statistical Feedback Control of a Plasma Etch Process”. IEEE Transactions on Semiconductor Manufacturing 7, pp. 1–11.
   Web of Science ®Google Scholar
• Mozumder, P. K.; Saxena, S.; and Collins, D. (1993). “A Monitor Wafer Based Controller for PECVD Silicon Nitride Process on AMT 5000”. Proceedings of the IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp. 136–141.
   Google Scholar
• Mozumder, P. K.; Saxena, S.; and Collins, D. (1994). “A Monitor Wafer based Controller for Semiconductor Processes”. IEEE Transactions on Semiconductor Manufacturing 7, pp. 400–411.
   Web of Science ®Google Scholar
• Sachs, E.; Guo, R. S.; Ha, S.; and Hu, A. (1991). “Process Control System for VLSI Fabrication”. IEEE Transactions on Semiconductor Manufacturing 4, pp. 134–143.
   Web of Science ®Google Scholar
• Sachs, E.; Hu, A; and Ingolfsson, A. (1991). “Modeling and Control of a Epitaxial Silicon Deposition Process with Step Disturbances”. IEEE/SEMI Advanced Semiconductor Manufacturing Conference Proceedings, pp. 104–107.
   Google Scholar
• Sachs, E.; Hu, A.; and Ingolfsson, A. (1995). “Run by Run Process Control: Combining SPC and Feedback Control”. IEEE Transactions on Semiconductor Manufacturing 8, pp. 26–43.
   Web of Science ®Google Scholar
• Sachs, E.; Ingolfsson, A.; and Ha, S. (1990). “Tuning a Process While Performing SPC: An Approach Based on Sequential Design of Experiments”. IEEE/SEMI Advanced Semiconductor Manufacturing Conference Proceedings, pp. 126–130.
   Google Scholar
• Shah, S. L. and Cluett, W. R. (1991). “Recursive Least Square Based Estimation Schemes for Self-Tuning Control”. Canadian Journal of Chemical Engineering 69, pp. 89–96.
   Web of Science ®Google Scholar
• Toivonen, H. T. (1983). “Variance Constrained Self-tuning Control”. Automatica 19, pp. 415–418.
   Web of Science ®Google Scholar
• Young, P. (1984). Recursive Estimation and Time-Series Analysis. Springer-Verlag, New York, NY.
   Google Scholar
• Yunker, S. and Moreno, C. W. (1992). “Ultramax: Continuous Process Improvement Through Sequential Optimization”. Electric Power Research Institute, Palo Alto, CA.
   Google Scholar