Substrate temperature effects on infrared emissivity of TiN_x films

References

• Zhang Z, Gao Y, Luo H, et al. Solution-based fabrication of vanadium dioxide on F: SnO2 substrates with largely enhanced thermochromism and low-emissivity for energy-saving applications. Ener Environ Sci. 2014;4:4290–4297. doi: 10.1039/c1ee02092g
   Web of Science ®Google Scholar
• Wang Z, Wang B, Xu Z. Optically active helical polyurea@attapulgite composites with high dielectric constant and low infrared emissivity. J Mater Sci – Mater Electron. 2016;27:1–13. doi: 10.1007/s10854-015-3747-z
   Web of Science ®Google Scholar
• Chen Z, Zhou Y, Zhang T, et al. Preparation and characterization of optically active polyacetylene@CdTe quantum dots composites with Low infrared emissivity. J Inorg Organomet Polym. 2014;24:591–599. doi: 10.1007/s10904-014-0020-5
   Web of Science ®Google Scholar
• Lv XM, Gou XL, Wang HC, et al. Preparation, characterization of Low infrared emissivity stealth coating. Adv Mater. 2013;634–638:2502–2505.
   Google Scholar
• Zhang W, Xu G, Ding R, et al. Nacre biomimetic design – a possible approach to prepare low infrared emissivity composite coatings. Mat Sci Eng C-Mater. 2013;33(1):99–102. doi: 10.1016/j.msec.2012.08.012
   Web of Science ®Google Scholar
• Lain GC, Cemin F, Menezes CM, et al. Bias influence on titanium interlayer for titanium nitride films. Surf Eng. 2016;32:279–283. doi: 10.1179/1743294415Y.0000000097
   Web of Science ®Google Scholar
• Tan C, Zhou K, Kuang T, et al. Novel performances of in situ plasma nitriding-PVD duplex-treated nanocrystalline TiN coatings. Surf Eng. 2017;1:1–7.
   Google Scholar
• Ramaseshan R, Jose F, Rajagopalan S, et al. Preferentially oriented electron beam deposited TiN thin films using focused jet of nitrogen gas. Surf Eng. 2016;32:834–839. doi: 10.1080/02670844.2016.1159832
   Web of Science ®Google Scholar
• Deng J, Li S, Xing Y, et al. Studies on thermal shock resistance of TiN and TiAlN coatings under pulsed laser irradiation. Surf Eng. 2014;30:195–203. doi: 10.1179/1743294413Y.0000000236
   Web of Science ®Google Scholar
• Subramanian A, Pratap T, Kurup DA, et al. Titanium nitride deposition on aluminium for adhesion promotion. Surf Eng. 2016;32:272–278. doi: 10.1179/1743294415Y.0000000074
   Web of Science ®Google Scholar
• Zhao G, Zhao C, Wu L, et al. Study on the electrical and optical properties of vanadium doped TiN thin films prepared by atmospheric pressure chemical vapor. J Alloy Compd. 2013;569:1–5. doi: 10.1016/j.jallcom.2013.03.110
   Web of Science ®Google Scholar
• Jeyachandran YL, Narayandass SK, Mangalaraj D, et al. Properties of titanium nitride films prepared by direct current magnetron sputtering. Mater Sci Eng A. 2007;445–446:223–236. doi: 10.1016/j.msea.2006.09.021
   Web of Science ®Google Scholar
• Solovan MN, Brus VV, Maistruk EV, et al. Electrical and optical properties of TiN thin films. Inorg Mater. 2014;50:40–45. doi: 10.1134/S0020168514010178
   Web of Science ®Google Scholar
• Wuhrer R, Yeung WY. A study on the microstructure and property development of d.c. magnetron cosputtered ternary titanium aluminium nitride coatings part III effect of substrate bias voltage and temperature. J Mater Sci. 2002;37:1993–2004. doi: 10.1023/A:1015299115086
   Web of Science ®Google Scholar
• Hantehzadeh MR, Bavadi R, Sari AH, et al. The effect of substrate temperature on the structure and morphology of titanium nitride compounds grown by DC magnetron sputtering. J Fusion Energ. 2011;30:333–337. doi: 10.1007/s10894-011-9383-6
   Web of Science ®Google Scholar
• Ghobadi N, Ganji M, Luna C, et al. Effects of substrate temperature on the properties of sputtered TiN thin films. J Mater Sci – Mater Electron. 2016;27:1–9.
   Web of Science ®Google Scholar
• Warren BE. X-ray diffraction. London: Addison Wesley; 1969.
   Google Scholar
• Arshi N, Lu JQ, Joo YK, et al. Influence of nitrogen gas flow rate on the structural, morphological and electrical properties of sputtered TiN films. J Mater Sci – Mater Electron. 2013;24:1194–1202. doi: 10.1007/s10854-012-0905-4
   Web of Science ®Google Scholar
• Mishra SK, Kumar R, Sreemany M, et al. Ultrathin to nano thickness TiN coatings: processing, structural, mechanical behavior. J Mater Eng Perform. 2015;24:5013–5021. doi: 10.1007/s11665-015-1754-0
   Web of Science ®Google Scholar
• Hochst H, Bringans RD, Steiner P, et al. Photoemission study of the electronic structure of stoichiometric and substoichiometric TiN and ZrN. Phys Rev B. 1982;25:7183–7191. doi: 10.1103/PhysRevB.25.7183
   Web of Science ®Google Scholar
• Kirchner CN, Hallmeier KH, Szargan R, et al. Evaluation of thin film titanium nitride electrodes for electroanalytical applications. Electroanal. 2007;19:1023–1031. doi: 10.1002/elan.200703832
   Web of Science ®Google Scholar
• Combadiere L, Machet J. Reactive magnetron sputtering deposition of TiN films. 1. Influence of the substrate temperature on structure, composition and morphology of the films. Surf Coat Technol. 1997;88:17–27. doi: 10.1016/S0257-8972(96)02870-8
   Web of Science ®Google Scholar
• Sundgren JE, Johansson BO, Rockett A, et al. Tinx (0.6<x<1.2): atomic arrangements, electronic structure and recent results on crystal growth and physical properties of epitaxial layers. AIP Conf Proc. 1986;149:95–115. doi: 10.1063/1.36035
   Google Scholar
• Kun H. Solid state physics. Beijing: High Education Press; 1988.
   Google Scholar
• Grosse P. Freie elektronen in festkörpern. Berlin: Springer; 1979.
   Google Scholar