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IETE Journal of Research Volume 12, 1966 - Issue 8

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Original Articles

Selective Masking for Metal Contacts on Silicon Planar Devices

K. S. BalainCental Electronics Engineering Research Institute, Pilani, Rajasthan.

(Non-Member) &

V. S. ShekhawatCental Electronics Engineering Research Institute, Pilani, Rajasthan.

(Non-Member)

Pages 427-431 | Received 16 Dec 1965, Published online: 21 Aug 2015

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https://doi.org/10.1080/03772063.1966.11485341

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REFERENCES

Pagne, P. D., “Technology of transistor mask fabrication”, Semiconductor Products, 5 (5)(1962), 32.
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Singh, R. & Balain, K. S., “Growth and photoetching of oxide layers on silicon”, J. Inst. Telecm. Engrs, 11, (3) (1965), 105.
Google Scholar
Kodak, “Photosensitive resists for industry”, Industrial Data Book, P 7.
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Biondi, F. J., editor, Transistor Technology, 3 (D. Van Nostrand Co. Ltd.), 1958, 152.
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