REFERENCES
- Pagne, P. D., “Technology of transistor mask fabrication”, Semiconductor Products, 5 (5)(1962), 32.
- Singh, R. & Balain, K. S., “Growth and photoetching of oxide layers on silicon”, J. Inst. Telecm. Engrs, 11, (3) (1965), 105.
- Kodak, “Photosensitive resists for industry”, Industrial Data Book, P 7.
- Biondi, F. J., editor, Transistor Technology, 3 (D. Van Nostrand Co. Ltd.), 1958, 152.