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IETE Journal of Research Volume 26, 1980 - Issue 5
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Original Articles

Thin-Film Passive Components Using TaN

S.R. JawalekarDepartment of Electrical Engineering, Indian Institute of Technology, Bombay400 076.
,
P.K. ReddyDepartment of Electrical Engineering, Indian Institute of Technology, Bombay400 076.
&
M.N. MathurHindustan Aeronautics Limited, Hyderabad500 042.View further author information
Pages 265-267 | Received 13 Mar 1979, Published online: 11 Jul 2015

REFERENCES

  • Berry (R W), Hall (P M) & Harris (M T). Thin-film Technology. 1968. D. Van Nostrand Co., New York. P 328–393.
  • Westwood (W D), Waterhouse (N) & Wilcox (P S). Tantalum Thin-Films. 1975. Academic Press, London. P 138–161.
  • Teredesai (M P), Ajit (C N) & Jawalekar (S R). Thin-film Hybrid Circuits. Int. J. Electronics. 44, 1; 1978; 41–48.
  • Gerstenberg (D) & Calbick (C J). Effects of Nitrogen, Methane and Oxygen on Structure and Electrical Properties of Thin Tantalum Films. J. Appl. Phys. 35, 2; 1964; 402–407.
  • Coyne Jr. (H J) & Tauber (R N). Preparation, Structure and Properties of Sputtered Highly Nitride Tantalum Films. J. Appl. Phys. 39, 12; 1968; 5585–5597.
  • Nakamura (M), Fijimori (M) & Nishimura (Y). Improvement of Tantalum Nitride Resistors Film Stability Through Analysis on Plateau Phenomena. Jap. J. Appl Phys. 12, 1; 1973; 30–39.

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