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IETE Journal of Research Volume 26, 1980 - Issue 6

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Letters to the Editor

R.F. Sputtered Molybdenum Films

Awatar SinghSolid State Devices Division, Central Electronics Engineering Research Institute333 031.

Pages 299-300 | Received 05 Nov 1979, Published online: 11 Jul 2015

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https://doi.org/10.1080/03772063.1980.11452144

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REFERENCES

Singh (A). SARMOS Technology. Students, Journal IETE. 20, 4; 1979; 179–181.
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Rodriguez (A), Misra (M), Hesselbom (H J) & Tove (P A). Fabrication of Short-channel MOSFETs with Refractory Metal Gates Using RF Sputter Etching. Solid-State Electron. 19, 1; 1976; 17–21.
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Singh (A). Sputter Etching with Photo-resist Mask for MOST Fabrication. SSD/Int. Memo/78-IV.
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Singh (A) & Kemhadjian (H A). MOSFETs with Low Threshold. Microelectron & Reliab 1979.
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Singh (A). Spu-Del MOSFET Process. Proc. IEEE. 68, 4; 1980; 536–537.
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Singh (A). Improved SERMOSFET Process. Solid-State Electron. In Press 1980.
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