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Articles

Wide Bandgap Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

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  • A. B. Djurisic, and Y. H. Leung, “Optical properties of ZnO nanostructures,” Small, Vol. 2, pp. 944–61, 2006. doi: 10.1002/smll.200600134
  • A. M. Morales, and C. M. Lieber, “A laser ablation method for the synthesis of crystalline semiconductor nanowires,” Science, Vol. 279, pp. 208–11, 1998. doi: 10.1126/science.279.5348.208
  • H. W. Ra, K. S. Choi, J. H. Kim, Y. B. Hahn, and Y. H. Im, “Fabrication of ZnO nanowires using nanoscales pacer lithography for gas sensors,” Small, Vol. 4, pp. 1105–9, 2008. doi: 10.1002/smll.200700922
  • J. H. N. Kumar, and A. Dorfman, “Fabrication of optically enhanced ZnO nanorods and microrods using novel biocatalysts,” J. Nanosci. Nanotechnol., Vol. 5, pp. 1915–8, 2005. doi: 10.1166/jnn.2005.422
  • Z. R. Dai, Z. W. Pan, and Z. L. Wang, “Novel nanostructures of functional oxides synthesized by thermal evaporation,” Adv. Funct. Mater., Vol. 13, pp. 9–24, 2003. doi: 10.1002/adfm.200390013
  • U. Ozgur, Ya I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Dogan, V. Avrutin, S. J. Cho, and H. Morkoc, “A comprehensive review of ZnO materials and devices,” J. Appl. Phys., Vol. 98, pp. 041301, 2005. doi: 10.1063/1.1992666
  • C. Li, M. Furuta, T. Matsuda, T. Hiramatsu, H. Furuta, and T. Hirao, “RF power and thermal annealing effect on the properties of zinc oxide films prepared by radio frequency magnetron sputtering,” Adv. Mater. Sci. Eng., Vol. 2007, pp. 5, 2007.
  • J. J. Wu, and S. C. Liu, “Catalyst-free growth and characterization of ZnO nanorods,” J. Phys. Chem. B, Vol. 106, pp. 9546–51, 2002. doi: 10.1021/jp025969j
  • F. Jiang, C. Zheng, L. Wang, W. Fang, Y. Pu, and J. Dai, “The Growth and Properties of ZnO Film on Si(111) Substrate with an AlN Buffer by AP-MOCVD,” J. Lumin., Vol. 122–123, pp. 905–7, 2007. doi: 10.1016/j.jlumin.2006.01.322
  • J. H. Park, Y. J. Choi, and J. G. Park, “Synthesis of ZnO Nanowires and Nanosheets by an O2-assisted carbothermal reduction process,” J. Cryst. Growth, Vol. 280, pp. 161–7, 2005. doi: 10.1016/j.jcrysgro.2005.03.047
  • T. Hiramatsu, M. Furuta, H. Furuta, T. Matsuda, and T. Hirao, “Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering,” Jpn. J. Appl. Phys., Vol. 46 pp. 3319, 2007. doi: 10.1143/JJAP.46.3319
  • O. Hamad, G. Braunstein, H. Patil, and N. Dhere, “Effect of thermal treatment in oxygen, nitrogen, and air atmospheres on the electrical transport properties of zinc oxide thin films,” Thin Solid Films, Vol. 489, no. 1, pp. 303–9, 2005. doi: 10.1016/j.tsf.2005.04.103
  • Z. Tang, G. Jiang, P. C. Chan, J. K. Sin, and S. S. Lau, “Theory and experiments on RF sputtered tin oxide thin-films for gas sensing applications,” Sens. Actuators B Chem., Vol. 43, no. 1, pp. 161–4, 1997. doi: 10.1016/S0925-4005(97)00204-9
  • T. Yen, A. Haungs, S. J. Kim, A. Cartwright, and W. A. Anderson, “Effect of post-deposition processing on ZnO thin films and devices,” J. Electron. Mater., Vol. 39, no. 5, pp. 568–72, 2010. doi: 10.1007/s11664-009-0999-5
  • G. Xing, B. Yao, C. Cong, T. Yang, Y. Xie, B. Li, and D. Shen, “Effect of annealing on conductivity behavior of undoped zinc oxide prepared by RF magnetron sputtering,” J. Alloys Compd., Vol. 457, no. 1, pp. 36–41, 2008. doi: 10.1016/j.jallcom.2007.03.071
  • J.-H. Lee, “Effects of sputtering pressure and thickness on properties of ZnO: Al films deposited on polymer substrates,” J. Electroceramics, Vol. 23, no. 2–4, pp. 512–8, 2009. doi: 10.1007/s10832-008-9523-1
  • P. M. Parthangal, “Synthesis and Integration of Onedimensional Nanostructures for Chemical Gas Sensing Applications,” Ph.D. thesis, University of Maryland, 2007.
  • J. Xua, Q. Panb, Y. Shuna and Z. Tian, “Grain size control and gas sensing properties of ZnO gas sensor,” Sens Actuators B Chem., Vol. 66, pp. 277–9, 2000. doi: 10.1016/S0925-4005(00)00381-6
  • J.-B. Lee, H.-J. Lee, S.-H. Seo, and J.-S. Park, “Characterization of undoped and Cu-doped ZnO films for surface acoustic wave applications,” Thin Solid Films, Vol. 398–399, pp. 641–6, 2001. doi: 10.1016/S0040-6090(01)01332-3
  • J. H. Lee, K. H. Ko, and B. O. Park, “Electrical and optical properties of ZnO transparent conducting films by the sol-gel method,” J. Cryst. Growth, Vol. 247, pp. 119, 2003. doi: 10.1016/S0022-0248(02)01907-3
  • A. M. Peiro, P. Ravirajan and J. R. Durrant, “Hybrid polymer/metaloxide solar cells based on ZnO columnar structures,” J. Mater. Chem., Vol. 16, pp. 2088–96, 2006. doi: 10.1039/b602084d
  • M. Acosta, I. Riech, and E. Martín-Tovar, “Effects of the argon pressure on the optical band gap of zinc oxide thin films grown by nonreactive RF sputtering,” Adv. Cond. Matter Phys., Vol. 2013, pp. 6, 2013.
  • M. Medina-Montes, S. Lee, M. Pérez, L. Baldenegro-Pérez, M. Quevedo- López, B. Gnade, and R. Ramírez-Bon, “Effect of sputtered ZnO layers on behavior of thin-film transistors deposited at room temperature in a nonreactive atmosphere,” J. Electron. Mater., Vol. 40, no. 6, pp. 1461, 2011. doi: 10.1007/s11664-011-1608-y
  • M. Mirzaee, A. Zendehnam, and S. Miri, “Surface statistical properties of ZnO thin films produced by magnetron sputtering at different rates,” Sci. Iranica, Vol. 20, no. 3, pp. 1071–5, 2013.
  • I. Horcas, R. Fernandez, J. Gomez-Rodriguez, J. Colchero, J. Gómez-Herrero, and A. Baro, “Wsxm: a software for scanning probe microscopy and a tool for nanotechnology,” Rev. Sci. Instrum., Vol. 78, no. 1, pp. 013705, 2007. doi: 10.1063/1.2432410
  • W. Dang, Y. Q. Fu, J. Luo, A. Flewitt, and W. Milne, “Deposition and characterization of sputtered ZnO films,” Superlattices Microstruct., Vol. 42, no. 1, pp. 89–93, 2007. doi: 10.1016/j.spmi.2007.04.081
  • X. Zhou, Q. Xue, H. Chen, and C. Liu, “Current-voltage characteristics and ethanol gas sensing properties of ZnO thin film/Si heterojunction at room temperature,” Physica E, Vol. 42, pp. 2021–5, 2010. doi: 10.1016/j.physe.2010.03.008
  • L. M. Li, A. M. Mani, S. Salleh, and A. Alias, “Effect of flexible substrates on the structural and optical properties of ZnO films deposited by sputtering method,” Adv. Mater. Res., Vol. 1107, pp. 678–83, 2015. doi: 10.4028/www.scientific.net/AMR.1107.678
  • J. Tauc, (Ed.)., Amorphous and liquid semiconductors. Springer Science & Business Media, 2012.
  • V. S. Reddy, K. Das, A. Dhar, and S. Ray, “The effect of substrate temperature on the properties of ITO thin films for OLED applications,” Semicond. Sci. Technol., Vol. 21, no. 12, pp. 1747–52, 2006. doi: 10.1088/0268-1242/21/12/043
  • V. Srikant, and D. R. Clarke, “On the optical band gap of zinc oxide,” J. Appl. Phys., Vol. 83, no. 10, pp. 5447–51, 1998. doi: 10.1063/1.367375

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