REFERENCES
- Armitage , J. D. and Kirk , J. P. 1988 . Analysis of overlay distortion patterns . Proceedings SPIE: Integrated Circuit Metrology, Inspection and Process Control II , 921 : 207 – 222 .
- Arnold , W. H. 1988 . Overlay simulator for wafer steppers . Proceedings SPIE: Optical/Laser Microlithography , 922 : 94 – 105 .
- Arnold , W. H. 1983 . Image placement differences between 1:1 projection aligners and 10:1 reduction wafer steppers . Proceedings SPIE: Optical Microlithography , 394 : 87 – 98 .
- Brink , M. A. , Mol , C. G. M. and George , R. A. 1988 . Matching performance for multiple wafer steppers using an advanced metrology procedure . Proceedings SPIE: Integrated Circuit Metrology, Inspection, and Process Control II , 921 : 180 – 197 .
- Draper , N. R. and Smith , H. 1981 . Applied Regression Analysis New York : John Wiley and Sons .
- Hasan , T. F. , Katzman , S. U. and Perloff , D. S. 1980 . Automated electrical measurements of registration error in step-and-repeat optical lithography systems . IEEE Transactions on Electron Devices , 27 ( 12 ) : 2304 – 2312 .
- Lin , Z. and Wu , W. 1999 . Multiple linear regression analysis of the overlay accuracy model . IEEE Transaction on Semiconductor Manufacturing , 12 : 229 – 237 .
- MacMillen , D. and Ryden , W. D. 1982 . Analysis of image field placement deviations of a 5 × microlithographic reduction lens . Proceedings SPIE: Optical Microlithography-Technology , 334 : 78 – 89 .
- Magome , N. and Kawar , H. 1994 . Stepper stability improvement by a perfect self-calibration system . Proceedings SPIE , 2197 : 990 – 996 .
- Perloff , D. S. 1978 . A four-point electrical measurement technique for characterizing mask superposition errors on semiconductor wafer . IEEE Journal of Solid-State Circuits , 13 ( 4 ) : 436 – 444 .
- Peski , C. K. 1982 . Minimizing pattern registration errors through wafer stepper matching techniques . Solid State Technology , 25 ( 5 ) : 111 – 115 .
- Rangarajan , B. , Templeton , M. , Capodieci , L. , Subramanian , R. and Scranton , A. 1998 . Optimal sampling strategies for sub-100nm overlay . Proceedings SPIE , 3332 : 348 – 359 .
- Schmidt , D. and Charache , G. 1991 . Wafer process-induced distortion study for x-ray technology . Journal of Vacuum Science and Technology , 9 ( 6 ) : 3237 – 3240 .