Publication Cover
Integrated Ferroelectrics
An International Journal
Volume 64, 2004 - Issue 1
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Original Articles

Ferroelectric Field Effect Transistor Model Using Partitioned Ferroelectric Layer and Partial Polarization

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Pages 89-100 | Received 01 Apr 2004, Accepted 01 May 2004, Published online: 11 Aug 2010

REFERENCES

  • Bailey , M. and Ho , F. D. 2003 . “Metal-Ferroelectric-Semiconductor Field-Effect Transistor Modeling Using a partitioned Ferroelectric Layer,” . In Integrated Ferroelectrics , pp. 19 – 37 . Taylor and Francis Inc. .
  • Wu , S. 1974 . “ A new ferroelectric memory device, metal-ferroelectric-semiconductor transistor ” . In IEEE Transactions in Electron Devices 499 – 504 .
  • Chen , D. 1993 . Phenomena and Device Modeling of Ferroelectric on Semiconductor, PhD. Dissertation (University of Colorado at Colorado Springs
  • Tsividis , Y. 1987 . Operation and Modeling of the MOS Transistor , New York : McGraw Hill .
  • MacLeod , T. C. and Ho , F. D. 1999 . “Integrating partial polarization into metal-ferroelectric-semiconductor field effect transistor model,” . Integrated Ferroelectrics , 27 : 93 – 101 .
  • MacLeod , T. C. and Ho , F. D. 2002 . “Simulation model of a ferroelectric field effect transistor,” . Integrated Ferroelectrics , 49 : 51 – 59 .

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