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Integrated Ferroelectrics
An International Journal
Volume 69, 2005 - Issue 1
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Original Articles

Physical and Structural Properties of RF Magnetron Sputtered ZnO Films

Ren-Chuan Chang1 1Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China
,
Sheng-Yuan Chu1* 1Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China
,
Kuang-Yao Lo2 2Department of Applied Physics, National Chia Yi University , ChiaYi, Taiwan, Republic of China
,
Shih-Chieh Lo2 2Department of Applied Physics, National Chia Yi University , ChiaYi, Taiwan, Republic of China
&
Yi-Ren Huang2 1Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China
Pages 43-53 | Published online: 03 Sep 2006

REFERENCES

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  • Water, W. , and Chu, S. Y. , 2002. Physical and structural properties of ZnO sputtered films. , Materials Letters 55 (2002), pp. 67–72, [CSA].
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  • Ondo-Ndong, R. , Pascal-Delannoy, F. , Boyer, A. , Giani, A. , Foucaran, A. , and A , 2003. Structural properties of zinc oxide thin films prepared by r.f. magnetron sputtering , Mater. Sci. Eng. B 97 (2003), pp. 68–73.
  • Jou, J. H. , and Han, M. Y. , 1992. Substrate dependent internal stress in sputtered zinc oxide thin films , J. Appl. Phys. 71 (9) (1992), pp. 4333–4336.
  • Gupta, V. , and Mansingh, A. , 1996. Influence of postdeposition annealing on the structural and optical properties of sputtered zinc oxide film , J. Appl. Phys. 80 (2) (1996), pp. 1063–1073.
  • Eric, A. , 1998. Meulenkamp: Synthesis and growth of ZnO nanoparticles , J. Phys. Chem. B 102 (1998), pp. 5566–5572.

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