Preparation and Characterization of ZST Films for CMOS Applications

References

• Pamu , D. , Lakshminarayana Rao , G. and James Raju , K. C. 2007 . Effect of particle size and ZnO on microwave dielectric properties of (Zr0.8Sn0.2)TiO4 ceramics . Advances in Applied Ceramics , 108 : 202 – 207 .
   Google Scholar
• Kingon , A.-I. , Maria , J.-P. and Streiffer , S. K. 2000 . Alternative dielectrics to silicon dioxide for memory and logic devices . Nature , 406 : 1032 – 1038 .
   PubMed Web of Science ®Google Scholar
• Yang , R.-Y. , Su , Y.-K. , Weng , M.-H. and Ho , Y.-S. 2006 . Microstructure and electrical properties of (Zr, Sn)TiO4 thin film deposited on Si(1 0 0) using a sol–gel process . Appl. Surf. Sci. , 253 : 2203 – 2207 .
   Google Scholar
• Von Dover , R. B. , Schneemeyer , L. F. and Fleming , R. M. 1998 . Discovery of a useful thin-film dielectric using a composition-spread approach . Nature , 392 : 162 – 164 .
   Web of Science ®Google Scholar
• Pamu , D. , Sudheendran , K. , Ghanashyam Krishna , M. and James Raju , K. C. 2008 . Optical and microwave characteristics of ambient temperature deposited zirconium tin titanate high-k films . Eur. Phys. J. Appl. Phys. , 44 : 71 – 75 .
   Web of Science ®Google Scholar
• Swanpoel , R. 1983 . Determination of the thickness and optical constants of amorphous silicon . J. Phys. E: Sci. Instrum. , 16 : 1214 – 1222 .
   Google Scholar
• Suhail , M. H. , Mohan Rao , G. and Mohan , S. 1992 . Dc reactive magnetron sputtering of titanium-structural and optical characterization of TiO2 films . J. Appl. Phys. , 71 : 1421 – 1427 .
   Web of Science ®Google Scholar
• Suhail , M. H. , Mohan Rao , G. and Mohan , S. 1991 . Studies on the properties of zirconia films deposited by dc reactive magnetron sputtering . J. Vac. Sci. Technol. A. , 9 : 2675 – 2677 .
   Web of Science ®Google Scholar
• Chang , D.-A. , Lin , P. and Tseng , T.-Y. 1995 . Optical properties of ZrTiO4 films grown by radio-frequency magnetron sputtering . J. Appl. Phys. , 77 : 4445 – 4451 .
   Web of Science ®Google Scholar
• Huang , C.-L. and Hsu , C.-H. 2004 . Properties of reactively radio frequency-magnetron sputtered (Zr,Sn)TiO4 dielectric films . J. Appl. Phys. , 96 : 1186 – 1191 .
   Web of Science ®Google Scholar
• Cheng , W. X. , Ding , A. L. , Qiu , P. S. , He , X. Y. and Zheng , S. S. H. 2003 . Optical and dielectric properties of highly oriented (Zr0.8,Sn0.2)TiO4 thin films prepared by rf magnetron sputtering . Appl. Surf. Sci. , 214 : 136 – 142 .
   Web of Science ®Google Scholar
• Pamu , D. , Ghanashyam Krishna , M. , James Raju , K. C. and Anil Bhatnagar , K. 2005 . Ambient temperature growth of nanocrystalline titanium dioxide thin films . Solid State Commun. , 135 : 7 – 10 .
   Web of Science ®Google Scholar
• Pamu , D. , Sudheendran , K. , Ghanashyam Krishna , M. and James Raju , K. C. 2008 . Crystallographic texture, morphology, optical, and microwave dielectric properties of dc magnetron sputtered nanostructured zirconia thin films . J. Vac. Sci. Technol. A , 26 : 185 – 192 .
   Web of Science ®Google Scholar
• Tachibana , Y. , Ohsaki , H. , Hayashi , A. , Mitsui , A. and Hayashi , Y. 2000 . TiO2−X sputter for high rate deposition of TiO2 . Vacuum , 59 : 836 – 843 .
   Web of Science ®Google Scholar
• Pamu , D. , Lakshminarayana Rao , G. , James Raju , K. C. and Jacob , M. V. 2007 . Effect of CuO on the sintering and cryogenic microwave characteristics of (Zr0.8Sn0.2)TiO4 ceramics . Sci. Technol. Adv. Mater. , 8 : 469 – 476 .
   Web of Science ®Google Scholar
• Nakagawara , O. , Toyota , Y. , Kobayashi , M. , Yoshino , Y. , Tabata , H. and Kawai , T. 1996 . Electrical properties of (Zr,Sn)TiO4 dielectric thin film prepared by pulsed laser deposition . J. Appl. Phys. , 80 : 388 – 392 .
   Web of Science ®Google Scholar
• Viticoli , M. , Padeletti , G. , Kaciulis , S. , Ingo , G. M. , Pandolfi , L. and Zaldo , C. 2005 . Structural and dielectric properties of ZrTiO4 and (Zr0.8Sn0.2)TiO4 deposited by pulsed laser deposition . Mater. Sci. Eng. B , 118 : 87 – 91 .
   Web of Science ®Google Scholar
• Wu , L.-J. and Wu , J.-M. 2007 . Reduced leakage current and conduction mechanisms of sputtered platinum-doped lead barium zirconate thin films . J. Phys. D: Appl. Phys. , 40 : 4948 – 4952 .
   Web of Science ®Google Scholar
• Wallace , R. M. and Wilk , G. M. 2002 . High-k gate dielectric materials . Mater. Res. Bull. , 27 : 192 – 197 .
   Google Scholar