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Integrated Ferroelectrics
An International Journal
Volume 21, 1998 - Issue 1-4
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Session 4. Materials Processing-CVD

Low temperature deposition of Ba1-xSrxTiO3 thin films by ECR plasma-enhanced metalorganic chemical vapor deposition

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Pages 355-366 | Received 02 Apr 1998, Accepted 26 May 1998, Published online: 19 Aug 2006

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