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Integrated Ferroelectrics
An International Journal
Volume 27, 1999 - Issue 1-4
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Section M: Device integration issues

Remanence polarity effects on hydrogen damage of ferroelectric thin film capacitors

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Pages 195-203 | Received 07 Mar 1999, Published online: 19 Aug 2006

References

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  • Jones , R. E. Jr. , Zurcher , P. , Chu , P. , Taylor , D. J. , Zafar , S. , Jiang , B. and Gillespie , S. 1997 . Integrated Ferroelectrics , 15 : 199
  • Levine , L. 1983 . 386 McGraw Hill : Physical Chemistry .
  • Spetz , A. , Armgarth , M. and Lundstrom , I. 1988 . J. Appl. Phys. , 64 ( 3 )

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