References
- Williams OA, Nesladek M, Daenen M, Michaelson S, Hoffman A, Osawa E, Haenen K, Jackman RB: Diam. Relat. Mater., 2008, 17, 1080–1088.
- Askari SJ: Surf. Eng., 2009, 25, (6), 482–486.
- Askari SJ, Lu F: Surf. Eng., 2007, 23, (5), 350–354.
- Hu JP, Holt KB, Foord JS: Anal. Chem., 2009, 81, (14), 5663–5670.
- Lv M, Wei M, Rong F, Terashima C, Fujishima A, Gu ZZ: Electroanalysis, 2010, 22, 199–203.
- Yang NJ, Uetsuka H, Nebel CE: Adv. Funct. Mater., 2009, 19, 887–893.
- Rezek B, Shin DC, Nebel CE: Langmuir, 2007, 23, 7626–7633.
- Chailapakul O, Siangproh W, Tryk DA: Sensor Lett., 2006, 4, (2), 99–119.
- Zhou YL, Zhi JF: Electrochem. Commun., 2006, 8, 1811–1816.
- Xu NS, Huq SE: Mater. Sci. Eng. R, 2005, R48, 47–189.
- Zhang WJ, Wu Y, Wong WK, Meng XM, Chan CY, Bello I, Lifshitz Y, Lee ST: Appl. Phys. Lett., 2003, 83, 3365–3367.
- Lee YC, Lin SJ, Lin IN, Cheng HF: J. Appl. Phys., 2005, 97, 054310.
- Wang Q, Wang ZL, Li JJ, Huang Y, Li YL, Gu CZ, Cui Z: Appl. Phys. Lett., 2006, 89, 063105.
- Gao JH, Zhao LM, Hao HS: Physica B, 2010, 405B, 318–321.
- Joseph PT, Tai NH, Lee CY, Niu H, Pong WF, Lin IN: J. Appl. Phys., 2008, 103, 043720.
- Lin IN, Hsu T, Lin GM, Chou YP, Chen TT, Cheng HF: J. Vac. Sci. Technol. B, 2003, 21B, (3), 1074–1079.
- Kalish R: Appl. Surf. Sci., 1997, 117–118, 558–569.
- Roos M, Baranauskas V, Fontana M, Ceragioli HJ, Peterlevitz AC, Mallik K, Degasperi FT: Appl. Surf. Sci., 2007, 253, 7381–7386.
- Yamada T, Sawabe A, Koizumi S, Itoh J, Okano K: Appl. Phys. Lett., 2000, 76, 1297–1299.
- Gonon P, Deneuville A, Fontaine F, Gheeraert E, Campargue A, Chenevier M, Rodolphe S: J. Appl. Phys., 1995, 78, 7404–7406.
- Samlenski R, Haug C, Brenn R, Wild C, Locher R, Koidl P: Appl. Phys. Lett., 1995, 67, 2798–2800.
- Wang YG, Lau SP, Tay BK, Zhang XH: J. Appl. Phys., 2002, 92, 7253–7256.
- Bernard M, Deneuville A, Muret P: Diam. Relat. Mater., 2004, 13, 282–286.
- Jiang X, Frederick AuCK, Lee ST: J. Appl. Phys., 2002, 92, 2880–2883.