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Research Papers

Characteristics of porous GaN prepared by KOH photoelectrochemical etching

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Pages S6-412-S6-416 | Published online: 05 Dec 2014

References

  • S. J. Pearton, J. C. Zolper, R. J. Shul and F. Ren: ‘GaN: Processing, defects, and devices’, J. Appl. Phys., 1999, 86, 1–78.
  • P. C. Chang, Y. K. Su, K. J. Lee, C. L. Yu, S. J. Chang and C. H. Liu: ‘Improved performance of GaN-based Schottky barrier photodetectors by annealing Ir/Pt Schottky contact in O2’, J. Alloys Compd., 2010, 504, S429–S431.
  • M. Ali, V. Cimalla, V. Lebedev, H. Romanus, V. Tilak, D. Merfeld, P. Sandvik and O. Ambacher: ‘Pt/GaN Schottky diodes for hydrogen gas sensors’, Sens. Actuators B, Chem., 2006, 113, 797–804.
  • J. Schalwig, G. Müller, M. Eickhoff, O. Ambacher and M. Stutzmann: ‘Gas sensitive GaN/AlGaN-heterostructures’, Sens. Actuators B, Chem., 2002, 87, 425–430.
  • B. S. Zhang, M. Wu, J. P. Liu, J. Chen, J. J. Zhu, X. M. Shen, G. Feng, D. G. Zhao, Y. T. Wang, H. Yang and A. R. Boyd: ‘Reduction of tensile stress in GaN grown on Si(111) by inserting a low-temperature AlN interlayer’, J. Cryst. Growth, 2004, 270, 316–321.
  • J. C. Zhang, D. G. Zhao, J. F. Wang, Y. T. Wang, J. Chen, J. P. Liu and H. Yang: ‘The influence of AlN buffer layer thickness on the properties of GaN epilayer’, J. Cryst. Growth, 2004, 268, 24–29.
  • M. A. Moram, Y. Zhang, M. J. Kappers, Z. H. Barber and C. J. Humphreys: ‘Dislocation reduction in gallium nitride films using scandium nitride interlayers’, Appl. Phys. Lett., 2007, 91, 152101–152103.
  • A. P. Vajpeyi, S. Tripathy, S. J. Chua and E. A. Fitzgerald: ‘Investigation of optical properties of nanoporous GaN films’, Phys. E, Low-Dimens. Syst. Nanostruct., 2005, 28, 141–149.
  • H. Hartono, C. B. Soh, S. J. Chua and E. A. Fitzgerald: ‘Fabrication and characterization of nano-porous GaN template for strain relaxed GaN growth’, Phys. Status Solidi B, 2007, 244, 1793–1796.
  • B. K. Duan and P. W. Bohn: ‘High sensitivity hydrogen sensing with Pt-decorated porous gallium nitride prepared by metal-assisted electroless etching’, Analyst, 2010, 135, 902–907.
  • Y. D. Wang, S. J. Chua, M. S. Sander, P. Chen, S. Tripathy and C. G. Fonstad: ‘Fabrication and properties of nanoporous GaN films’, Appl. Phys. Lett., 2004, 85, 816–818.
  • D. J. Diaz, T. L. Williamson, I. Adesida, P. W. Bohn and R. J. Molnar: ‘Morphology and luminescence of porous GaN generated via Pt-assisted electroless etching’, J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., 2002, 20, 2375–2383.
  • D. J. Diaz, T. L. Williamson, I. Adesida, P. W. Bohn and R. J. Molnar: ‘Morphology evolution and luminescence properties of porous GaN generated via Pt-assisted electroless etching of hydride vapor phase epitaxy GaN on sapphire’, J. Appl. Phys., 2003, 94, 7526–7534.
  • F. K. Yam, Z. Hassan, L. S. Chuah and Y. P. Ali: ‘Investigation of structural and optical properties of nanoporous GaN film’, Appl. Surf. Sci., 2007, 253, 7429–7434.
  • X. Y. Guo, T. L. Williamson and P. W. Bohn: ‘Enhanced ultraviolet photoconductivity in porous GaN prepared by metal-assisted electroless etching’, Solid State Commun., 2006, 140, 159–162.
  • A. P. Vajpeyi, S. J. Chua, S. Tripathy, E. A. Fitzgerald, W. Liu, P. Chen and L. S. Wang: ‘High Optical Quality Nanoporous GaN Prepared by Photoelectrochemical Etching’, Electrochem. Solid-State Lett., 2005, 8, G85–G88.
  • F. K. Yam, Z. Hassan and S. S. Ng: ‘Porous GaN prepared by UV assisted electrochemical etching’, Thin Solid Films, 2007, 515, 3469–3474.
  • C. H. Ko, Y. K. Su, S. J. Chang, W. H. Lan, J. Webb, M. C. Tu and Y. T. Cherng: ‘Photo-enhanced chemical wet etching of GaN’, Mater. Sci. Eng. B, 2002, 96, 43–47.
  • L. Zhao, C. Liu, X. Teng, S. Sun, W. Zhang, J. Zhu, Y. Feng and B. Guo: ‘The surface topography of GaN grown on Si (111) substrate before and after wet chemical etching’, Mater. Sci. Semicond. Process., 2006, 9, 403–406.
  • A. P. Vajpeyi, S. Tripathy, S. R. Shannigrahi, B. C. Foo, L. S. Wang, S. J. Chua and E. Alves: ‘Influence of Rapid Thermal Annealing on the Luminescence Properties of Nanoporous GaN Films’, Electrochem. Solid-State Lett., 2006, 9, G150–G154.
  • S. Qu, S. Li, Y. Peng, X. Zhu, X. Hu, C. Wang, X. Chen, Y. Gao and X. Xu: ‘Influence of the growth temperature of AlN buffer on the quality and stress of GaN films grown on 6H–SiC substrate by MOVPE’, J. Alloys Compd., 2010, 502, 417–422.
  • T. Metzger, R. Höpler, E. Born, O. Ambacher, M. Stutzmann, R. Stömmer, M. Schuster, H. Göbel, S. Christiansen, M. Albrecht and H. P. Strunk: ‘Defect structure of epitaxial GaN films determined by transmission electron microscopy and triple-axis X-ray diffractometry’, Philos. Mag. A, 1998, 77, 1013–1025.
  • M. Kuball: ‘Raman spectroscopy of GaN, AlGaN and AlN for process and growth monitoring/control’, Surf. Interface Anal., 2001, 31, 987–999.
  • F. K. Yam and Z. Hassan: ‘Structural and optical characteristics of porous GaN generated by electroless chemical etching’, Mater. Lett., 2009, 63, 724–727.

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