References
- S. U. Jen, C. C. Yu, C. H. Liu and G. Y. Lee: Thin Solid Films, 2003, 434, 316–322.
- F. Löffler, C. Siewert and C. Ascher: Surf Coat. Technol, 2003, 174-175, 1287–1292.
- H. Chiriac, M. Urse, F. Rusu and M. Neagu: Sens. Actuat. A, 1999, 76A, 376–380.
- I. Ayerdi, E. Castailo, A. Garcia-Alonso and F. J. Gracia: Sens. Actuat. A, 1995, 46A, 218–221.
- J. C. Thou and Y. Q. Peng: J. Centr. South Univ. Technol., 2003, 10, 91–99.
- I. H. AKazi, P. M. Wild, T. N. Moore and M. Sayer: Thin Solid Films, 2003, 433, 337–343.
- G. Alonso, J. Garcia, E. Castaiio, et al.: Sens. Actuat. A, 1993, 37-38A, 784–789.
- Y. Sato, M. Watanabe and S. Sato: Jpn Soc. Appl. Phys., 2001, 4, 5091–5094.
- J. Musil and F. Regent: J. Vac. Sci Tchnol. A, 1998, 16A, 3301–3304.
- Y. Q. Zhang, X. P. Dong and J. S. Wu: Mater. Sci Eng. B, 2004, 11311, 154–160.
- J. Musil and J. Vlcek: Mater. Chem. Phys., 1998, 54, 116–122.
- J. Musil and J. Vlcek: Thin Solid Films, 1999, 343-344, 47–50.
- W. Tang, K. W. Xu, P. Wang and X. Li: Microelectronic. Eng., 2003, 66, 445–450.
- A. K. Kulkarni and L. C. Chang: Thin Solid Films, 1997, 301, 17–22.
- Y. Zhao, Y. Qian, W. Yu and Z. Chen: Thin Solid Films, 1996, 286, 45–48.
- H. W. Kim and N. H. Kim: Mater. Sci. Semicond. Process., 2004, 7, 1–6.
- J. W. Lim, K. Mimura and M. Isshiki: Appl. Surf Sci., 2003, 217, 95–99.