References
- Lozano-Morales A., Renz R. P., Fortman J. J. and Taylor E. J.: ‘Electrically mediated process for functinal and decorative trivalent chromium electroplating: an alternative to hexavalent chromium’, ECS Trans., 2007, 6, 51–61. doi: 10.1149/1.2790401
- Zeng Z. X. and Zhang J. Y.: ‘Electrodeposition and tribological behavior of amorphous chromium-alumina composite coatings’, Surf. Coat. Technol., 2008, 202, 2725–2730. doi: 10.1016/j.surfcoat.2007.10.008
- Rosestolato D., Battaglin G. and Ferro S.: ‘Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: s preliminary study’, Electrochem. Commun., 2014, 49, 9–13. doi: 10.1016/j.elecom.2014.09.019
- Nygren K., Samuelsson M., Flink A., Ljungcrantz H. and Rudolphi A. K.: ‘Growth and characterization of chromium carbide films deposited by high rate reactive magnetron sputtering for electrical contact applications’, Surf. Coat. Technol., 2014, 260, 326–334. doi: 10.1016/j.surfcoat.2014.06.069
- Ruden A., Restrepo-Parra E., Paladines A. U. and Sequeda F.: ‘Corrosion resistance of CrN thin films produced by dc magnetron sputtering’, Appl. Surf. Sci., 2013, 270, 150–156. doi: 10.1016/j.apsusc.2012.12.148
- Xie T. T., Mao S. D., Yu C., Wang S. and Song Z. L: ‘Structure, corrosion, and hardness properties of Ti/Al multilayers coated on NdFeB by magnetron sputtering’, Vacuum, 2012, 86, 1583–1588. doi: 10.1016/j.vacuum.2012.03.019
- Tsan Kenneth Chiang K. and Wei R. H.: ‘Growth morphology and corrosion resistance of magnetron sputtered Cr films’, Surf. Coat. Technol., 2011, 206, 1660–1665. doi: 10.1016/j.surfcoat.2011.09.020
- Shi Y., Long S., Yang S. and Pan F.: ‘Structural and tribological properties of CrTiAlN coatings on Mg alloy by closed-field unbalanced magnetron sputtering ion plating’, Appl. Surf. Sci., 2008, 254, 7342–7350. doi: 10.1016/j.apsusc.2008.05.338
- Pan C., Liu L., Li Y., Wang S. and Wang F. H.: ‘Passive film growth mechanism of nanocrystalline 304 stainless steel prepared by magnetron sputtering and deep rolling techniques’, Electrochim. Acta, 2011, 56, 7740–7748. doi: 10.1016/j.electacta.2011.05.106
- Li Y. and Wang F. H.: ‘Effects of surface nanocrystallization on the electrochemical corrosion behavior of metals’, Corros. Prot., 2003, 24, 6–12.
- Djouadi M. A., Nouveau C., Banakh O., Sanjines R., Levy F. and Nouet G.: ‘Stress profiles and thermal stability of CrxNy films deposited by magnetron sputtering’, Surf. Coat. Technol., 2002, 151-152, 510–514. doi: 10.1016/S0257-8972(01)01635-8
- Lan D., Wang Y. and Cao Z. Q.: ‘Studies on the corrosion elecrochemical behavior of nanocrystalline Cr in acidic media’, J. Liaoning Techn. Univ., 2012, 31, 387–391.
- Manea A. C., Buda M. and Visan T.: ‘Electrochemical impedance spectroscopy investigations of tantalum and its passive films in some acidic solutions’, U.P.B. Sci. Bull. B, 72B, 2010, 65–78.
- Radjabov T. D., Kamardin A. I. and Sharudo A. V.: ‘The investigation of two-layer protective-decorative coatings on oxide substrates’, Vacuum, 2004, 75, 143–147. doi: 10.1016/j.vacuum.2004.01.078
- Schneider M., Schroth S., Schilm J. and Michaelis A.: ‘Micro-EIS of anodic thin oxide films on titanium for capacitor applications’, Electrochim. Acta, 2009, 54, 2663–2671. doi: 10.1016/j.electacta.2008.11.003
- Li T. S., Liu L., Zhang B., Li Y., Yan F. K., Tao N. R. and Wang F. H.: ‘Passive behavior of a bulk nanostructured 316L austenitic stainless steel consisting of nanometer-sized grains with embedded nano-twin bundles’, Corros. Sci., 2014, 85, 331–342. doi: 10.1016/j.corsci.2014.04.039