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Integrated Ferroelectrics
An International Journal
Volume 31, 2000 - Issue 1-4
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Section D: Integration

Mechanisms of Pb(zr0.53Ti0.47)O3 thin film etching with ECR/RF reactor

J. Baborowski Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
,
P. Muralt Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
,
N. Ledermann Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
,
E. Colla Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
,
A. Seifert Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
,
S. Gentil Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
&
N. Setter Laboratoire de Céramique, Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland
 show all
Pages 261-271 | Received 10 Apr 2000, Published online: 12 Sep 2006

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