Supplemental material
Materials Research Letters
Volume 12, 2024 - Issue 8
Original Reports
Influence of co-sputtering AlB2 to TaB2 on stoichiometry of non-reactively sputtered boride thin films
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Shuyao Lina Institute of Materials Science and Technology, TU Wien, Vienna, Austria;b Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Swedenhttps://orcid.org/0000-0003-4979-4174View further author information
https://orcid.org/0000-0003-4979-4174View further author information, M. Podsednikc Institute of Chemical Technologies and Analytics, TU Wien, Wien, Austria;d KAI Kompetenzzentrum Automobil- und Industrieelektronik GmbH, Villach, Austriahttps://orcid.org/0009-0008-8953-5445View further author information
https://orcid.org/0009-0008-8953-5445View further author information, , T. Wojcika Institute of Materials Science and Technology, TU Wien, Vienna, Austriahttps://orcid.org/0000-0001-5091-5215View further author information
https://orcid.org/0000-0001-5091-5215View further author information, A. Limbeckc Institute of Chemical Technologies and Analytics, TU Wien, Wien, Austriahttps://orcid.org/0000-0001-5042-2445View further author information
https://orcid.org/0000-0001-5042-2445View further author information, Nikola Koutnáa Institute of Materials Science and Technology, TU Wien, Vienna, Austria;b Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Swedenhttps://orcid.org/0000-0001-7901-4736View further author information
https://orcid.org/0000-0001-7901-4736View further author information & Paul H. Mayrhofera Institute of Materials Science and Technology, TU Wien, Vienna, Austriahttps://orcid.org/0000-0001-7328-9333View further author information
https://orcid.org/0000-0001-7328-9333View further author information show all