Effective silicon production from SiCl₄ source using hydrogen radicals generated and transported at atmospheric pressure

References

• Lynch D, Ben W, Ji X, et al. Review of developments in production of silicon for photovoltaic, supplemental proceedings of TMS 2011 140th annual meeting and exhibition. Materials processing and energy materials, The Minerals Metals & Materials Society (TMS). New Jersey (USA): John Wiley & Sons Inc.; 2011. p. 685–692.
   Google Scholar
• Schweickert H, Reuschel K, Gutsche H. Production of high-purity semiconductor materials for electrical purposes. United States Patent, US3,011,877. 1961 Dec.5
   Google Scholar
• Gutsche H. Method for producing highest-purity silicon for electric semiconductor devices. United State. Patent, US3,042,494. 1962 July 3
   Google Scholar
• Hou Y, Xie G, Tao D, et al. Thermodynamic study on SiCl4 hydrogenation system in siemens process. J Chem Eng Jpn. 2011;44:214.
   Web of Science ®Google Scholar
• Sumiya M, Akizuki T, Itaka K, et al. Effect of hydrogen radical on decomposition of chlorosilane source gases. J Phys Conf Ser. 2013;441(12003):1–6.
   Google Scholar
• Dahmani F, Okamoto Y, Tsutsumi D, et al. Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl4 reduction. Jpn J Appl Phys. 2018;57(51301):1–4. .
   Google Scholar
• Umemoto H, Ohara K, Morita D, et al. Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH4/H2 system. J Appl Phys. 2002;91:1650–1656.
   Web of Science ®Google Scholar
• Feenstra K, Schropp R, van der Weg W. Deposition of amorphous silicon films by hot-wire chemical vapor deposition. J Appl Phys. 1999;85:6843–6852.
   Web of Science ®Google Scholar
• Otsuka T, Ihara M, Komiyama H. Hydrogen dissociation on hot tantalum and tungsten filaments under diamond deposition conditions. J Appl Phys. 1995;77:893–898.
   Web of Science ®Google Scholar
• Schwarz S, Rosiwal S, Frank M, et al. Dependence of the growth rate, quality, and morphology of diamond coatings on the pressure during the CVD-process in an industrial hot-filament plant. Diamond Rel Mater. 2002;11:589–595.
   Web of Science ®Google Scholar
• Umemoto H, Setoguchi S, Uemura H, et al. Coating techniques of metal chambers for remote catalytic chemical vapor deposition applications. J Vac Sci Technol A. 2008;26:309–311.
   Web of Science ®Google Scholar
• Redman A, Chung C, Ashfold M. H atom production in a hot filament chemical vapour deposition reactor. Diam Relat Mater. 1999;8:1383–1387.
   Web of Science ®Google Scholar
• Comerford D, D’Haenens-Johansson U, Smith J, et al. Filament seasoning and its effect on the chemistry prevailing in hot filament activated gas mixtures used in diamond chemical vapour deposition. Thin Solid Films. 2008;516:521–525.
   Web of Science ®Google Scholar
• Profijt H, Potts S, van de Sanden M, et al. Plasma-assisted atomic layer deposition: basics, opportunities, and challenges. J Vac Sci Technol A. 2011;29(50801):1–26.
   Google Scholar
• Tamura K, Ohba H, Shibata T. Temperature distributions of a conductively heated filament. JAERI-Tech. 1999 Jul;99(50):1–8. Japanese.
   Google Scholar
• Desal P, Chu K, James H, et al. Electrical resistivity of selected elements. J Phys Chem Ref Data. 1984;13:1069–1096.
   Web of Science ®Google Scholar
• Miura H, Kuroki Y, Yasui K, et al. Evaluation of hydrogen atom density generated on a tungsten mesh surface. Thin Solid Films. 2008;516:503–505.
   Web of Science ®Google Scholar
• Morimoto T, Umemoto H, Yoneyama K, et al. Quantification of gas-phase H-atom number density by tungsten phosphate glass. Jpn J Appl Phys. 2005;44:732–735.
   Web of Science ®Google Scholar
• Umemoto H, Matsumura H. Future prospect of remote Cat-CVD on the basis of the production, transportation and detection of H atoms. Thin Solid Films. 2008;516:500–502.
   Web of Science ®Google Scholar
• Meier U, Kohse-Hoinghaus K, Schafer L, et al. Two-photon excited LIF determination of H-atom concentrations near a heated filament in a low pressure H2 environment. Appl Opt. 1990;29:4993–4999.
   PubMed Web of Science ®Google Scholar
• Umemoto H. Production and detection of H atoms and vibrationally excited H2 molecules in CVD processes. Chem Vap Deposition. 2010;16:275–290. .
   Google Scholar
• Theuerer H. Epitaxial silicon films by the hydrogen reduction of SiCl4. J Electrochem Soc. 1961;108:649–653.
   Web of Science ®Google Scholar
• Shabir Q, Pokale A, Loni A, et al. Medically biodegradable hydrogenated amorphous silicon microspheres. Silicon. 2011;3:173–176.
   Web of Science ®Google Scholar